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采用相转化法制备了PVDF-HFP基多孔聚合物电解质,研究了PVDF-HFP的溶解温度、溶剂用量以及非溶剂用量等因素对聚合物电解质性能的影响,分别采用交流阻抗法和稳态电流法测定了聚合物电解质膜的离子电导率和离子迁移数,并通过扫描电镜观察了多孔聚合物膜的表面形貌,研究表明,制备PVDF-HFP多孔聚合物电解质膜的合适条件为:溶胶温度50~60℃、溶胶时间2 h、溶剂与PVDF的质量比为9~11、非溶剂与PVDF的质量比为0.5~0.25.该条件下制得的多孔聚合物电解质膜的孔隙率达到70%左右、离子迁移数在0.3左右、室温离子电导率达到1.6×10-3 S·cm-1.

参考文献

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