为在不锈钢表面制备铝化物阻氚渗透层奠定基础,采用AlCl3-MEIC(氯化1-甲基3-乙基咪唑)室温熔盐在HR-2不锈钢表面进行镀铝实验,主要研究镀前处理方式,电流密度对镀层的形貌、结合力、纯度的影响.结果表明,采用AlCl3-MEIC室温熔盐体系在HR-2不锈钢上镀铝是可行的.传统的酸洗镀前处理能得到质量较高的镀层,但界面结合不好;电化学清洗镀前处理后可制得结合良好的高质量镀层.纯白色铝镀层表面光滑、均匀、致密,呈现有一定棱角的球形颗粒状生长特性.镀层颗粒尺寸随电流密度的增加而增大.较优的电流密度范围为10～20 mA cm-2,电镀时间至少40 min.
参考文献
| [1] | Benamati G;Chabrol C;Perujo A et al.[J].Journal of Nuclear Materials,1999,271-272:391. |
| [2] | Konys J.[A].UCLA,2004 |
| [3] | Aiello A;Ciampichetti A;Benamati G .[J].Journal of Nuclear Materials,2004,329-333:139. |
| [4] | 张守民,周永洽.钕铁硼磁体在有机电解质中的电镀铝研究[J].南开大学学报（自然科学版）,1999(04):63-65. |
| [5] | 李庆峰,邱竹贤,N.J.Bjerrum.铝在NaCl-AlCl3熔盐体系中的电化学沉积[J].稀有金属材料与工程,1995(03):59-63. |
| [6] | Lai K;Kazacos M .[J].Journal of Electroanalytical Chemistry,1988,248:431. |
| [7] | Jiang T;Brym MJC;Dube G;Lasia A;Brisard GM .Electrodeposition of aluminium from ionic liquids: Part I - electrodeposition and surface morphology of aluminium from aluminium chloride (AlCl3)-l-ethyl-3-methylimidazolium chloride ([EMIm]Cl) ionic liquids[J].Surface & Coatings Technology,2006(1/2):1-9. |
| [8] | Lee J-J.;Miller B. .Aluminum Deposition and Nucleation on Nitrogen-Incorporated Tetrahedral Amorphous Carbon Electrodes in Ambient Temperature Chloroaluminate Melts[J].Journal of the Electrochemical Society,2000(9):3370-3376. |
| [9] | Carlin R T;Crawford W;Bersh M .[J].Journal of the Electrochemical Society,1992,139(10):2720. |
| [10] | Qin Q;Skyllas K X M .[J].Journal of Electroanalytical Chemistry,1984,168:193. |
| [11] | Lai P K;Skyllas-Kazacos M .[J].Electrochimica Acta,1987,32(10):1443. |
| [12] | Robinson J;Osteryoung R A .[J].Journal of the Electrochemical Society,1980,127(01):123. |
| [13] | 韩文生,谢锐兵,萧以德.钕铁硼稀土永磁材料室温熔盐电镀铝的研究[J].材料保护,2005(10):1-4. |
| [14] | Chang J K;Chen S Y;Wen Ta Tsai et al.[J].Journal of the Electrochemical Society,2008,155(03):C112. |
| [15] | Liu QX;El Abedin SZ;Endres F .Electroplating of mild steel by aluminium in a first generation ionic liquid: A green alternative to commercial Al-plating in organic solvents[J].Surface & Coatings Technology,2006(3/4):1352-1356. |
| [16] | 逢清强 .[D].杭州:浙江大学,2000. |
| [17] | Yang C C .[J].Materials Chemistry and Physics,1994,37(04):335. |
| [18] | 朱立群.功能膜层的电沉积理论与技术[M].Beijing:Beihang UniversityPress,2005:26. |
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