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目前,少有Cu—Ni-P合金电沉积的研究报道,为此,采用电沉积法制备了Cu.Ni.P镀层,通过循环伏安法考察了铜在Cu—Ni—P镀液中的电化学行为,在此基础上,采用恒电位电沉积法在柠檬酸体系中制备了cu—Ni—P2-元合金镀层,并对镀层的形貌和硬度进行了表征。结果表明:不能单独与铜共沉积的非金属元素P,在一定的工艺条件下,通过在有铜离子的溶液中与镍的诱导共沉积,可以与铜形成Cu.Ni-P合金镀层;Cu.Ni—P合金镀层形貌良好,硬度比Cu镀层有显著提高。

参考文献

[1] Preparation, corrosion and structural properties of Cu-Ni multilayers from sulphate/citrate bath[J].Corrosion Science: The Journal on Environmental Degradation of Materials and its Control,2009(9):2139.
[2] T. A. Green;A. E. Russell;S. Roy .The development of a stable citrate electrolyte for the electrodeposition of copper-nickel alloys[J].Journal of the Electrochemical Society,1998(3):875-881.
[3] Jen-Che Hsu;Kwang-Lung Lin .Enhancement in the Deposition Behavior and Deposit Properties of Electroless Ni-Cu-P[J].Journal of the Electrochemical Society,2003(9):C653-C656.
[4] Stojan S. Djokic .Electrodeposition of amorphous alloys based on the iron group of metals[J].Journal of the Electrochemical Society,1999(5):1824-1828.
[5] Smith R J;Breakspear S;Seelagh A CambellB .[J].Trans lnst Met Finish,2003,81:55-59.
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