３％ＮａＣｌ溶液中铜的表面膜及ＢＴＡ膜的光电化学研究任聚杰，杨迈之，童汝亭，蔡生民（河北医学院石家庄０５００１７）（北京大学北京１００８７１）（河北师范大学石家庄０５００１６）１引言人们已经注意到Ｃｌ－对Ｃｕ有腐蚀作用［１，２］，关于ＢＴＡ对Ｃｕ的缓蚀作用亦有过一些研究［３－６］，但并未论及ＢＴＡ与Ｃｕ表面的结合情况，且用光电化学方法研究Ｃｌ－存在下ＢＴＡ对Ｃｕ缓蚀的文章尚未见到。本工作采用?...
The corrosion behavior of copper and the inhibition of BTA for copper in 3% NaCl solution have been investigated by photo-electrochemical and XPS met hods. The results show that the surface film of copper in the solution is composed of Cu(I),O2-and Cl-However,CuCl has not been found as the primary component in the surfaCe film.The inhibition of BTA could be attributed to the formation of a protective and adsorptive film on Cu2O.The adsorption of BTA does not change the semiconductive properties of Cu2O on copper.
参考文献
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