从对薄膜材料不断增长的性能要求出发,介绍了(Zr, Sn)TiO_4薄膜的晶体结构特征,主要阐述了其已有的制备工艺及电性能的研究进展.提出(Zr, Sn)TiO_4薄膜的制备方法将得到拓展和改进,指出了其今后的研究方向.
From the piont of the increasing requirement on the performance of thin film materials, the crystal structure, preparation technologies, electrical properties of (Zr, Sn)TiO_4 thin films were mainly summarized. It was proposed that the preparation methods would be extended and modified. And the reserch focus was also pionted out.
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