采用脉冲激光沉积方法在Si(100)衬底上制备了类金刚石薄膜,利用椭圆偏振光谱,拉曼光谱及X光电子能谱研究了衬底温度对薄膜的结构和光学性质的影响.结果表明较低衬底温度制备的薄膜的光学常数具有典型的类金刚石特征.衬底温度的升高导致了薄膜的有序化,使得薄膜的sp3键成分改变,从而影响了薄膜的光学常数.衬底温度过高,导致薄膜严重石墨化,表面粗糙度增加,不利于制备高质量类金刚石薄膜.
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