利用磁过滤阴极电弧镀在硬质合金上沉积厚度约2～3μm的TiA1N薄膜,并用MEVVA源离子对TiA1N薄膜注入金属离子V+和Nb+.应用北京同步辐射装置(BSRF)的同步辐射光源,采用掠入射X射线衍射(GIXRD)的方法对TiA1N薄膜表面离子注入层的微观结构进行分析研究.结果表明:未经过离子注入的TiA1N薄膜主要组成相是没有择优取向的Ti3AlN伴有少量A1N,而较小剂量(1×1017ions/cm2)的离子注入都可以使Ti3AlN产生(111)上的择优取向和细化晶粒,且A1N消失;当离子注入的剂量达到5×1017ions/cm2时,注入V+的Ti3AlN择优取向变为(210),并产生TiN相;注入Nb+的各个衍射峰完全消失,说明TiA1N薄膜表面离子注入层被非晶化,结合透射电镜的研究结果,观察到非晶层的厚度约为80～100 nm.
参考文献
| [1] | Paul H M;Chirsitan M.Microstruetural Design of Hard Coatings[J].Progress in Materials Science,2006(51):1080. |
| [2] | Niyomsoan S;Wgrant;OlsonD L.Variation of Color in Titanium and Zirconium Nitdde Decorative Thin Film[J].THIN SOLID FILMS,2004(415):187. |
| [3] | Ma LW;Cairney JM;Hoffman MJ;Munroe PR .Deformation and fracture of TiN and TiAlN coatings on a steel substrate during nanoindentation[J].Surface & Coatings Technology,2006(11):3518-3526. |
| [4] | Kamiya S;Nagasawa H;Yamanobe K;Saka M .A comparative study of the mechanical strength of chemical vapor-deposited diamond and physical vapor-deposited hard coatings[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2005(1):123-131. |
| [5] | Onate J I;Alonso F;Garcia A.Improvement of Tribologieal Properties by Ion Implantation[J].THIN SOLID FILMS,1998(317):471. |
| [6] | Yi Z.Surface Properties of Nb+ C Ion Co-Implanted Stainless Steel[J].Surface and Coatings Technology,2000(131):360. |
| [7] | 谈政,强颖怀.TiN离子注入金属表面改性的研究[J].煤矿机械,2004(01):32-34. |
| [8] | 姜晓明.掠入射X射线衍射和散射实验技术及其应用[J].物理,1996(10):623. |
| [9] | 赵传荣;赵迄东.同步辐射技术应用发展简介[J].呼伦贝尔学院学报,2004(01):2. |
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