采用聚合物先驱体热解技术,以聚合物先驱体-聚碳硅烷(Polycarbosilane,PCS)为原料,在催化剂辅助作用下,于1200℃热解制备出超长碳化硅(SiC)纳米线.采用电子能量散射(EDS)、扫描电镜(SEM)、透射电镜(TEM)和x射线衍射(XRD)等分析手段对SiC纳米线进行了表征.结果表明,所制备的纳米线为高结晶性β-SiC,纳米线直径约为30 nm～300 nm,长度可达数毫米.利用.气-固"生长机制对SiC纳米线的生长过程进行了分析.
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