采用激光脉冲分子束外延技术,在(100)取向的SrTiO3单晶基片上成功外延生长了LaAlO3/BaTiO3超晶格薄膜.在超晶格薄膜生长过程中,采用高能电子衍射技术(RHEED)对LaAlO3/BaTiO3超晶格薄膜的生长过程以及平面晶格变化进行了分析.通过对超晶格薄膜中各层RHEED衍射条纹的分析计算发现超晶格薄膜存在一个临界厚度,其值约为17nm,当超晶格薄膜的厚度小于该临界厚度时,晶格畸变在逐渐增加,当厚度超过该临界厚度时,晶格畸变因弛豫现象的产生而逐渐减小.超晶格薄膜中不同层的RHEED衍射条纹的差别说明了由于不同应力的作用使超晶格薄膜中LAO层和BTO层表面粗糙度不同.
参考文献
[1] | Erbil A;Kim Y;Gerhardt R A .[J].Physical Review Letters,1996,77(08):1628-1631. |
[2] | Nakagawara O.;Shimuta T.;Makino T.;Arai S.;Tabata H.;Kawai T. .Dependence of dielectric and ferroelectric behaviors on growth orientation in epitaxial BaTiO3/SrTiO3 superlattices[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2002(3/4):397-401. |
[3] | Tabata H;Tanaka H;Kawai T .[J].Applied Physics Letters,1994,65(15):1970-1972. |
[4] | Kim J;Kim Y;Kim Y S;at al .[J].Applied Physics Letters,2002,80(19):3581-3583. |
[5] | Wang Zaiyang;Oda S .[J].Journal of the Electrochemical Society,2000,147(12):4615-4617. |
[6] | Le Marrec F;Farhi R;Ariosa D et al.[J].Ferroelectrics,2000,254(01):125-131. |
[7] | Park B E;Ishiwara H .[J].Applied Physics Letters,2001,79(06):806-808. |
[8] | Wang Y P;Zhou L;Lu X B et al.[J].Surface Science Applications,2003,205(176-181) |
[9] | Dabrowska-Szata M. .Analysis of RHEED pattern from semiconductor surfaces[J].Materials Chemistry and Physics,2003(2/3):257-259. |
[10] | Yoneda Y.;Sakaue K.;Terauchi H. .RHEED observation of BaTiO3 thin films grown by MBE[J].Surface Science: A Journal Devoted to the Physics and Chemistry of Interfaces,2003(3):283-287. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%