利用高分子共混物的微相分离和白组装原理,采用溶液共混和旋转涂膜的方法制得聚苯乙烯/聚甲基丙烯酸甲酯(PS/PMMA)高分子共混物薄膜,对薄膜经过再加工得到具有纳米微孔的PMMA薄膜,研究了对溶液进行超声处理的时间、PS/PMMA共混物溶液浓度、旋涂转速和试片表面对掩膜形貌的影响.以此PMMA薄膜为掩膜对GaP表面进行湿法腐蚀,得到一种蜂窝状的表面微结构,它能使发光二极管(LED)的光功率平均提高18%.
Planar process is the foremost technology in fabrication of surface microstructure which is common in semiconductor devices. In microstructure fabrication, self-assembly is a technology which attracts much attention recently. In this artide, based on the micro-phase separation and self-assembly of polymer blends, a polystyrene/poly methyl methacrylate(PS/PMMA)blend film was formed by solution co-blending and spin coating. A mask in which many nano-holes distribute regularly was developed from this film. The factors which affect film pattern were researched, such as the time of ultrasonic processing, the rate of spin coating, the concentration of polymer blends solution. An alveolate microstructure was fabricated on light-emitting-diode(LED)surface by wet etching with this mask, and the LED output power increases by 18% in average.
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