欢迎登录材料期刊网

材料期刊网

中国科学院金属研究所 科学出版社
高级检索
  1. 首页
  2. 期刊
  3. 材料热处理学报
  4. Al含量对(V,W,Al)N复合膜微观组织和抗氧化性能的影响

材料热处理学报, 2014, 35(10): 172-177.

Al含量对(V,W,Al)N复合膜微观组织和抗氧化性能的影响

喻利花 1, , 王杰 2, , 许俊华 3,

1.江苏科技大学材料科学与工程学院,江苏省先进焊接技术重点实验室,江苏镇江212003

2.江苏科技大学材料科学与工程学院,江苏省先进焊接技术重点实验室,江苏镇江212003

3.江苏科技大学材料科学与工程学院,江苏省先进焊接技术重点实验室,江苏镇江212003

基金项目:   国家自然科学基金(51074080)  

关键词： (V,W,Al)N复合膜 , 微观组织 , 力学性能 , 抗氧化性能

Influence of Al content on microstructure and oxidation resistance of (V, W, Al) N composite films

Keywords： (V,W,Al) N composite films , microstructure , mechanical property , oxidation resistance

采用多靶磁控溅射仪,制备不同Al含量的(V,W,Al)N复合膜.利用X射线衍射仪、纳米压痕仪和热处理炉及热失重分析仪对(V,W,Al)N复合膜的微观组织、力学性能及高温抗氧化性能进行表征.结果表明:当Al含量低于14.86 at％时,(V,W,Al)N复合膜存在面心立方结构(V,W)N、WN相及六方结构V2N相,当Al含量高于14.86 at％时,薄膜存在面心立方结构(V,W)N、WN相及六方结构V2N和AlN相;随Al原子百分含量的增加,复合膜的硬度呈先增大后减小的趋势,当Al原子百分含量达到14.86 at％时,其硬度最大值为35.5 GPa;随Al含量的增加,(V,W,Al)N复合膜抗氧化性能提高了至少200 ℃.讨论Al含量对(V,W,Al)N复合膜性能的影响.

参考文献

[1] Tsai YZ;Duh JG .Thermal stability and microstructure characterization of CrN/WN multilayer coatings fabricated by ion-beam assisted deposition[J].Surface & Coatings Technology,2005(5/6):1683-1689.
[2] Lü Yan-hong;JI Li;LIU Xiao-gong et al.Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering[J].Applied Surface Science,2012,258:3864-3870.
[3] Bin Deng;Ye Tao;Deliang Guo .Effects of vanadium ion implantation on microstructure, mechanical and tribological properties of TiN coatings[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2012(22):9080-9086.
[4] Tsai, D.-C.;Huang, Y.-L.;Lin, S.-R.;Jung, D.-R.;Shieu, F.-S. .Effect of nitrogen flow ratios on the microstructure and properties of (TiVCr)N coatings by reactive magnetic sputtering[J].Nuclear Instruments and Methods in Physics Research, Section B. Beam Interactions with Materials and Atoms,2011(7):685-691.
[5] 汝强,胡社军,陈俊芳,黄拿灿,赵灵智,邱秀丽,胡显奇.TC11钛合金表面电弧离子镀TiAlN涂层防护性能的研究[J].金属热处理,2006(07):33-36.
[6] Barshilia HC;Selvakumar N;Deepthi B;Rajam KS .A comparative study of reactive direct current magnetron sputtered CrAlN and CrN coatings[J].Surface & Coatings Technology,2006(6):2193-2201.
[7] Eun Young Choi;Myung Chang Kang;Dong Hee Kwon;Dong Woo Shin;Kwang Ho Kim .Comparative studies on microstructure and mechanical properties of CrN, Cr-C-N and Cr-Mo-N coatings[J].Journal of Materials Processing Technology,2007(0):566-570.
[8] Barshilia HC;Yogesh K;Rajam KS .Deposition of TiAlN coatings using reactive bipolar-pulsed direct current unbalanced magnetron sputtering[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2008(2):427-434.
[9] Franz, R.;Lechthaler, M.;Polzer, C.;Mitterer, C. .Oxidation behaviour and tribological properties of arc-evaporated ZrAlN hard coatings[J].Surface & Coatings Technology,2012(8/9):2337-2345.
[10] Tanno, Yasuo;Azushima, Akira .Frictional property of Ti-B-N coating with preferred grain orientations deposited by arc ion plating under dry condition[J].Surface & Coatings Technology,2009(23):3631-3637.
[11] Wan-Yu Wu;Chia-Hao Wu;Bo-Hong Xiao;Ting-Xin Yang;Shi-Yi Lin;Ping-Hung Chen;Chi-Lung Chang.Microstructure, mechanical and tribological properties of CrWN films deposited by DC magnetron sputtering[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2013:209-212.
[12] Araiza, JJ;Sanchez, O;Albella, JM .Influence of the aluminum incorporation on the structure of sputtered ZrNx films deposited at low temperatures[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2009(10):1236-1239.
[13] A. Glaser;S. Surnev;F.P. Netzer;N. Fateh;G.A. Fontalvo;C. Mitterer .Oxidation of vanadium nitride and titanium nitride coatings[J].Surface Science: A Journal Devoted to the Physics and Chemistry of Interfaces,2007(4):1153-1159.
[14] 许俊华,曹峻,喻利花.TiVCN复合膜的微结构、力学性能与摩擦磨损性能研究[J].金属学报,2012(05):555-560.
[15] Wan-Yu Wu;Chia-Hao Wu;Bo-Hong Xiao;Ting-Xin Yang;Shi-Yi Lin;Ping-Hung Chen;Chi-Lung Chang.Microstructure, mechanical and tribological properties of CrWN films deposited by DC magnetron sputtering[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2013:209-212.
[16] Fox-Rabinovich GS;Yamamoto K;Veldhuis SC;Kovalev AI;Shuster LS;Ning L .Self-adaptive wear behavior of nano-multilayered TiAlCrN/WN coatings under severe machining conditions[J].Surface & Coatings Technology,2006(3/4):1852-1860.
[17] Reeswinkel, T.;Sangiovanni, D.G.;Chirita, V.;Hultman, L.;Schneider, J.M. .Structure and mechanical properties of TiAlN-WNx thin films[J].Surface & Coatings Technology,2011(20):4821-4827.
[18] 李学梅,尤建飞,董松涛,汪蕾,许俊华.Ti-Si-Al-N纳米复合膜的组织与性能[J].材料热处理学报,2009(06):144-148.
[19] 钟春良,董师润,喻利花,许俊华.Cr1-xAlxN涂层的微结构和抗氧化性能研究[J].表面技术,2007(06):12-14,24.
[20] 葛云科,顾晓波,喻利花,许俊华.（Zr,Al）N薄膜的微结构及性能研究[J].材料开发与应用,2008(01):21-25,37.
[21] 喻利花,薛安俊,董松涛,许俊华.Si含量对Ti-Al-Si-N薄膜微结构与力学性能的影响[J].材料热处理学报,2010(07):140-145.
[22] 罗飞,何欣,杨会生,高克玮,王燕斌.溅射工艺对TiAlN薄膜摩擦学性能的影响[J].航空材料学报,2007(02):33-36.
[23] 秦聪祥,胡社军,汝强.Al含量对真空电弧沉积ZrAlN薄膜性能的影响[J].材料保护,2007(03):1-3,23.
[24] Barshilia HC;Selvakumar N;Deepthi B;Rajam KS .A comparative study of reactive direct current magnetron sputtered CrAlN and CrN coatings[J].Surface & Coatings Technology,2006(6):2193-2201.
[25] J.F. Yang;Z.G. Yuan;Q. Liu;X.P. Wang;Q.F. Fang .Characterization Of Mo-al-n Nanocrystalline Films Synthesized By Reactive Magnetron Sputtering[J].Materials Research Bulletin: An International Journal Reporting Research on Crystal Growth and Materials Preparation and Characterization,2009(1):86-90.
[26] 周志烽,范玉殿.薄膜热应力的研究[J].真空科学与技术,1996(05):347-354.
[27] 申雁鸣,贺洪波,邵淑英,范正修.沉积温度对电子束蒸发HfO2薄膜残余应力的影响[J].中国激光,2006(06):827-831.
[28] 文懋 .NbN、WNx单层膜以及NbN基多层膜的微观结构和力学性能的研究[D].吉林:吉林大学,2010.
[29] 王惠;马德军 .残余压应力场中薄膜纳米测量硬度的变化与校正[J].研究探讨,2005,11:70-72.
[30] LIN Jian-liang;Malki Pinkas;Willliam D Sproul et al.The phase and microstructure of CrAlN films deposited by pulsed dc magnetron sputtering with synchronous and asynchronous bipolar pulses[J].THIN SOLID FILMS,2011,520:166-173.
[31] Farges G;Beauprez E;Degout D .Preparation and characterization of V-N films deposited by reactive triode magnetron sputtering[J].Surface and Coatings Technology,1992,54-55:115-120.
[32] 王永康,雷廷权,夏立芳,熊仁章.Ti0.5Al0.5N涂层的抗高温氧化行为[J].材料工程,2001(01):12-14.
[33] 张馨元,赵广彬,孙爱祥,葛高峰,栾道成.非平衡磁控溅射TiAlN薄膜的高温抗氧化性能研究[J].真空,2011(05):61-63.
[34] Lin J;Mishra B;Moore JJ;Sproul WD .A study of the oxidation behavior of CrN and CrAlN thin films in air using DSC and TGA analyses[J].Surface & Coatings Technology,2008(14):3272-3283.
[35] 余春燕,王社斌,尹小定,许并社.CrAlN薄膜高温抗氧化性的研究[J].稀有金属材料与工程,2009(06):1015-1018.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
作者相关
文章评分
  • 您的评分：
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%

版权所有©2010中国科学院金属研究所中国科技出版传媒股份有限公司

本系统由北京仁和汇智信息技术有限公司设计开发

技术支持：info@rhhz.net