采用Heck偶联法和三氯化铁氧化还原聚合法合成了两种新型的D/A-PTh衍生物,聚(3-(2-(4叔丁基笨基)-5-(4乙烯苯基)-1,3,4-惡二唑))噻吩(P3OXDT)和聚(3-辛-4-(2-(4-叔丁基笨基)-5-(4-乙烯苯基)-1,3,4-惡二唑))-聚3-辛噻吩(P3O40XDT-P30T)共聚物,它们都以聚噻吩作为主链并且含有1,3,4-惡二唑侧基.通过UV-Vis,1H NMR,凝胶渗透色谱(GPC)和荧光光谱仪(PL)进行定性分析,并与聚3辛基噻吩(P3OT)进行了对比研究.它们都具有较高的分子量,展示出了良好的可溶性,好的成膜能力.热重分析表明,这3种材料都具有较好的热稳定性.与P3OT相比,通过在P3O4OXD-P3OT侧链引入1,3,4-惡二唑衍生物明显地增加了聚合物的能隙,紫外光谱、荧光发射光谱都发生了明显的蓝移.P3OXDT,P3OT和P3O4OXD-P3OT在氯仿中的荧光量子产率分别是0.31、0.05和0.04.
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