采用电子回旋共振微波等离子体源增强磁控溅射沉积氧化铝薄膜.X射线光电子谱和X射线衍射分析表明,在600℃沉积温度下,Si（100）基片上获得了亚稳的具有化学计量配比成分、面心立方结构的γ-Al2O3薄膜.薄膜的折射率为1.7,与稳定的α-Al2O3体材料相当.
The aluminium oxide films were deposited on Si(100) substrate by plasma source enhanced magnetron sputtering by using an electron cyclotron resonance (ECR) microwave plasma source and a direct current magnetron sputtering target. X-ray photoelectron spectroscopy (XPS) and glancing angle X-ray diffraction patterns show that the metastable stoichiometric γ-Al2O3 films can be obtained at a higher deposition temperature of 600℃. The refractive index of the films is 1.7, corresponding with that of stable α-Al2O3.
参考文献
| [1] | Van den Hoven G N, Koper R J I M, Polman A, et al. Appl. Phys. Lett., 1996, 68: 1886--1888. [2] Lazarouk S K, Mudryi A V, Borisenko V E. Appl. Phys. Lett., 1998, 73: 2272--2274. [3] Kik P G, Polman A. MRS Bull., 1998, B 23: 48--50. [4] Jimenez de Castro M, Serna R, Chaos J A, et al. Nucl. Instr. Meth., 2000, B 166--167: 793--797. [5] Polman A, Poate J M, J. Appl. Phys., 1993, 73: 1669--1675. [6] 雷明凯，王大庸，张仲麟. 真空科学与技术学报，1996, 16: 299--305. [7] Lei M K, Chen J D, Wang Y, et al. Vacuum, 2000, 57: 327--338. [8] Zywitzki O, Hoetzsch G. Surf. Coat. Technol., 1996, 86-87: 640--647. [9] Schneider J M, Sproul W D, Matthews A. Surf. Coat. Technol., 1997, 94--95: 179--183. [10] 雷明凯，袁力江，张仲麟, 等(LEI Ming-Kai, et al). 无机?材料学报(Journal of Inorganic Materials)，1999, 14 (1): 189--192. [11] Lei M K, Zhang Z L, Ma T C. Surf. Coat. Technol., 2000, 131: 317--325. [12] Lei M K, Li Q, Zhou Z F, et al. Thin Solid Films, 2001, 389: 194--199. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%