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This paper mainly describes a research of fabrication-technology of silicon magnetic-sensitive transistor (SMST) with rectangle-plank-cubic structure fabricated on silicon wafer by MEMS technique. An experiment research on basic characteristic of the silicon magnetic-sensitive transistor was done. Anisotropic etching and reliable technique project were provided and applied in order to fabricate SMST with rectangle-plank-cubic construction. This means that a new kind of fabrication technology for silicon magnetic-sensitive transistor was provided. The result shows that the technique can be not only compatible with IC technology but also integrated easily, and has a wide application field.