Growth mechanism of polycrystalline Ir coating by double glow plasma technology

金属学报(英文版), 2012, 25(6): 469-479.

^1, , ^2,

1.College of Material Science and Technology, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China

2.College of Material Science and Technology, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China

基金项目: the Funding of Jiangsu Innovation Program for Graduate Education(CXLX11_0207) This work was financially supported by the National Natural Science Foundation of China(50872055/E020703) the Fundamental Research Funds for the Central Universities,the Funding for Outstanding Doctoral Dissertation in NUAA(BCXJ11-09)

Growth mechanism of polycrystalline Ir coating by double glow plasma technology

Wangping WU ^1, , Zhaofeng CHEN ^2,

1.College of Material Science and Technology, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China

2.College of Material Science and Technology, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China

Keywords： Growth mechanism

参考文献

[1]	T.L.CHEN;X.ZHANG;S.ZHANG .Comparative study of epitaxial growth of Pt and Ir electrode films grown on MgO-buffered Si(l00) by PLD[J].Applied physics, A. Materials science & processing,2005(1):73-76.
[2]	Z. F. Chen;W. P. Wu;L B. Wang .Microstructure and analytic equation of conical aggregate in iridium coating prepared by double glow plasma[J].Surface Engineering,2011(4):242-245.
[3]	K. L. Ekinci .Formation of polycrystalline structure in metallic films in the early stages of zone I growth[J].Acta materialia,1998(13):4549-4558.

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