作为众多的薄膜制备方法之一,旋涂法具备薄膜厚度精确可控、高性价比、节能、低污染等优势,在微电子技术、纳米光子学、生物学、医学等领域中有着广阔的应用前景.本文简单介绍了旋涂法的模型、机理及其主要参数的估算方法,并总结了近几年来用旋涂法制备光学、微电子学等功能薄膜的新进展,最后对旋涂法的发展前景进行了展望.
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