研究了Ag在NH_3-O_2和NH_3-H_2O_2水溶液体系中的浸取行为.结果表明,在常压下氧化剂浓度低时(如在NH_3-O_2体系中),浸取反应受在Ag表面上生成的氧化物膜所阻碍;而在浓度足够高的氧化剂时(如在NH_3-H_2O_2体系中),浸取过程可在不生成氧化物膜的条件下进行,此时Ag的溶解速度受传质步骤控制.文中讨论了在氨性溶液中Ag氧化浸取的反应机理.
The leaching behaviour of Ag in NH_3-O_2 and NH_3-H_2O_2 aqueous solutions was investigated. The results show that the dissolution of Ag was restrained by forming of a silver suboxide film on the surface under low oxidant concentration and atmospheric pressure conditions (e.g., in NH_3-O_2-H_2O system); when the concentration of oxidant was high enough (e.g., in NH_3-H_2O_2-H_2O system), the leaching process was carried out without forming of the film and the rate of dissolution of Ag was controlled by a step of mass transfer. Based on experimental results, a reaction mechanism of oxidation leaching of Ag in ammoniacal solutions was discussed.
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