Electric Current-induced Failure of 200-nm-thick Gold Interconnects

材料科学技术（英文）, 2008, 24(6): 895-898.

^1, , ^2, , ^3, , ^4,

1.Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences,Shenyang 110016, China;School of Materials & Metallurgy, Northeastern University, Shenyang 110004, China

2.School of Materials & Metallurgy, Northeastern University, Shenyang 110004, China

3.Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences,Shenyang 110016, China

4.Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences,Shenyang 110016, China

基金项目: 国家自然科学基金(50571103) 国家高技术研究发展计划(863计划)(2004CB619303)

Electric Current-induced Failure of 200-nm-thick Gold Interconnects

Bin ZHANG ^1, , Qingyuan YU ^2, , Jun TAN ^3, , Guangping ZHANG ^4,

1.Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences,Shenyang 110016, China;School of Materials & Metallurgy, Northeastern University, Shenyang 110004, China

2.School of Materials & Metallurgy, Northeastern University, Shenyang 110004, China

3.Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences,Shenyang 110016, China

4.Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences,Shenyang 110016, China

Keywords： Au interconnect

200-nm-thick Au interconnects on a quartz substrate were tested in-situ inside a dual-beam microscope by applying direct current,alternating current and alternating current with a small direct current component.The failure behavior of the Au interconnects under three kinds of electric currents were characterized in-situ by scanning electron microscopy.It is found that the formation of voids and subsequent growth perpendicular to the interconnect direction is the fatal failure mode for all the Au interconnects under three kinds of electric currents.The failure mechanism of the ultrathin metal lines induced by the electric currents was analyzed.

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