以混合的氧化锗粉和硅粉为原料,采用水热法在高温高压下制备出具有核-壳同轴结构的Ge/SiOx纳米电缆.扫描和透射电镜研究表明这种Ge/SiOx纳米同轴电缆的产量高,直径分布均匀,长度可达微米级,并证实其为非晶态SiOx包裹Ge内核的核-壳结构.Ge芯线沿着[211]方向生长.Ge/SiOx纳米同轴电缆的生长过程遵循气-液-固和氧化物辅助生长机制,与原料中GeO2与Si的比率有关.
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