采用三电极体系,以钼片为工作电极,大面积铂网为辅助电极,饱和甘汞电极(SCE)为参比电极,以氯化铜、氯化铟、亚硒酸为原料,在无水乙醇溶液中,用阴极恒流和恒压两种沉积方法制备出CIS前驱体薄膜,采用XRD和EDAX对制备的薄膜进行了表征,分析了沉积方式、镀液离子浓度、导电盐(LiCl)含量及热处理工艺等因素对薄膜成分及形貌的影响,并对电沉积CIS薄膜的机理进行了初步探讨.在最优条件下所制备的薄膜成分接近标准比且表面致密、均匀.
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