离子注入制备纳米晶研究进展

材料导报, 2002, 16(9): 46-36.

离子注入制备纳米晶研究进展

封向东 ^1, , 王治国 ^2, , 祖小涛 ^3, , 霍永忠 ^4, , 林理彬 ^5,

1.四川大学辐射物理及技术教育部重点实验室,四川大学物理系,成都,610064

2.四川大学辐射物理及技术教育部重点实验室,四川大学物理系,成都,610064

3.四川大学辐射物理及技术教育部重点实验室,四川大学物理系,成都,610064

4.中科院上海硅酸盐研究所,上海,200050

5.四川大学辐射物理及技术教育部重点实验室,四川大学物理系,成都,610064

基金项目: 国家自然科学基金(10175042)

关键词：离子注入 , 金属纳米晶 , 半导体纳米晶 , 磁性材料纳米晶

Advances in Research on Embedded Nanocrystal Formed by Ion Implantation

离子注入技术是一种在材料近表面形成埋层纳米晶的一种非常有效的方法.纳米晶的出现使得基体材料具有特殊的物理性质.综述了近几年来利用离子注入技术形成的金属、半导体、磁性材料纳米晶的发展情况及其潜在的应用,并提出了现存的问题.

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材料期刊网

离子注入制备纳米晶研究进展

Advances in Research on Embedded Nanocrystal Formed by Ion Implantation

参考文献