利用化学镀制得Ni-P化学镀层,研究镀液组分含量对Ni-P化学镀镀速的影响规律.结果表明:Ni-P化学镀镀速随主盐NiSO4·6H2O、还原剂NaH2PO2·H2O、络合剂C6H8O7·H2O及缓冲剂CH4COONa含量的增加而先增加后降低;当NiSO4·6H2O,NaH2PO2·H2O和C6H8O7·H2O的质量浓度为30,20,10 g/L,Ni-P化学镀镀速的最大值为15.3,19.1,18.4μm/h;当CH4COONa的质量浓度16~20 g/L,Ni-P化学镀的镀速变化不大,平均镀速为15.6μm/h.
Ni?P coatings were prepared by electroless plating method on 45 steel,and effect of plating contents on the plating rate for Ni?P electroless plating was investigated. The results show that the plating rate is first increased and then decreased,when the content of NiSO4·6H2O,NaH2PO2·H2O,C6H8O7·H2O and CH4COONa is increased. The max plating rate is 15.3μm/h,if the content of NiSO4·6H2O is 30 g/L. The max rate is 19.1μm/h,when the content of NaH2PO2·H2O is 20 g/L. The max rate is 18.4μm/h,when the content of C6H8O7·H2O is 10 g/L. And the average rate is 15.6μm/h,when the content of CH4COONa is 16-20 g/L.
参考文献
[1] | Harrington R F .Reactively controlled directive arrays[J].IEEE Transactions on Antennas and Propagation,1978,26(05):390-395. |
[2] | 牛俊伟,周良明,钟顺时.电抗加载圆形定向天线阵的理论与实验研究[J].微波学报,2003(04):50-53. |
[3] | 潘文俊,童创明,周明.等离子体与等离子体隐身技术[J].电讯技术,2009(08):108-112. |
[4] | 王晶,李晓波.等离子体产生方法及隐身技术分析[J].飞机设计,2011(02):25-29. |
[5] | 石磊,丁君,丁芊,郭陈江.等离子体单极天线辐射特性和隐身性能研究[J].航空计算技术,2009(01):31-34. |
[6] | 柳锐锋,付海波,陈诚.非磁化等离子体与电磁波的作用[J].现代防御技术,2006(05):81-85. |
- 下载量()
- 访问量()
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%