简要评述了磁控溅射法制备氮化碳(CNx)薄膜的研究进展的现状,以及磁控溅射法制备氮化碳(CNx)薄膜过程中工艺参数对薄膜的结构和性能的影响,展望了氮化碳研究的发展趋势.
参考文献
[1] | Rodil S E;Muhl S;Maca S et al.Optical gap in carbon nitride films[J].Thin Solid Films,2003,433:119. |
[2] | Yuki Togashi;Yuko Hirohata;Tomoaki Hino .Characterization of CNx films prepared by reactive magenetron sputtering[J].Vacuum,2002,66:391. |
[3] | Qi J.;Bello I.;Lee CS.;Lee ST.;Luo JB.;Wen SZ.;Chan CY. .Film thickness effects on mechanical and tribological properties of nitrogenated diamond-like carbon films[J].Surface & Coatings Technology,2001(1/3):38-43. |
[4] | 莫少波,刘英,杨业智,程宇航.氮化碳薄膜的X射线光电子谱[J].光谱学与光谱分析,1999(05):734-737. |
[5] | Zheng W T;Sjostrom H;Ivanov I et al.Reactive magnetron sputter desostted CNx: Effects of N2 pressure and growth temperature on film compositinon, binding and microstructure[J].Journal of Science and Technology,1996,A14:2696. |
[6] | Sjostrom H;Stafatrom S;Boman M et al.Superhard and elastic carbon nitride thin films having fullerence like microstructure[J].Physical Review,1995,75:1336. |
[7] | Liu A Y;Cohen M L .Prediction of new low compressibility solids[J].Science,1989,245:841. |
[8] | Liu A Y;Cohen M L .Structural properties and electronic structure of low compressibility material β-Si3N4 and -C3N4[J].Physical Review B,1990,41(15):10727. |
[9] | 陈光华,吴现成,贺德衍.氮化碳薄膜的结构与特性[J].无机材料学报,2001(02):377-380. |
[10] | Teter D M;Hemley R J .Low compressibility carbon nitrides[J].Science,1996,271:53. |
[11] | Ujvari T;Szikora B;Mohai M et al.Effect of plasma parameters on the structure of CNx layers deposited by DC magnetron sputtering[J].Diamond and Related Materials,2002,11:1200. |
[12] | Fendrych F;Pajasova L;Wagner T et al.CNX coatings sputtered by DC magnetron:hardnees,nitrogenation and optical properties[J].Diamond and Related Materials,1999,8:1711. |
[13] | Durand-Drouhin O;Benlahsen M .Internal stress of sputtered amorphous carbon nitride thin films[J].Solid State Communications,2004(7):425-429. |
[14] | Kusano Y;Evetts J E;Somekh R E et al.Properties of carbon nitride films deposited by magnetron sputtering[J].Thin Solid Films,1998,332:56. |
[15] | Sjosrom H;Ivanov I;Johansson M et al.Reactive magnetron sputter deposition of CNx films on Si (001) substrates: films growth, microstructure and mechanical properties[J].Thin Solid Films,1994,246:103. |
[16] | Li JJ.;Zheng WT.;Jin ZS.;Lu XY.;Gu GR.;Mei XX.;Dong C. .Influence of substrate dc bias on chemical bonding, adhesion and roughness of carbon nitride films[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2002(1/4):273-279. |
[17] | 李俊杰,王欣,卞海蛟,郑伟涛,吕宪义,金曾孙,孙龙.磁控溅射CNx薄膜的附着力、粗糙度与衬底偏压的关系[J].发光学报,2003(03):305-308. |
[18] | 肖兴成,江伟辉,宋力昕,田静芬,胡行方.艺参数对 a-CNx膜沉积的影响[J].无机材料学报,2000(01):183-187. |
[19] | 郑伟涛;丁涛;李海波 等.磁控溅射参数对CNx薄膜成分、化学结合状态和硬度的影响[J].材料科学与工艺,1997,5(01) |
[20] | Therasse M;Benlahsen M .Effects of deposition temperature on the structure of amorphous carbon nitride films[J].Solid State Communications,2004,129:139. |
[21] | Akiyama M.;Chhowalla M.;Amaratunga GAJ.;Alexandrou I. .Optimizing hardness of CNx thin films by dc magnetron sputtering and a statistical approach[J].Journal of Materials Science,2001(22):5397-5401. |
[22] | 郑伟涛,李海波,王煜明,J.E.Sundgren.磁控溅射CNx薄膜的结构与硬度关系研究[J].科学通报,1999(08):822. |
[23] | Gammon W J;Kraft O;Reilly A C et al.Experimental comparison of N( 1 s) X-ray photoelectron spectroscopy binding energies of hard and elastic amorphous carbon nitride films with reference organic compounds[J].CARBON,2003,41:1917. |
[24] | Bertran E.;Pino FJ.;Viera G.;Andujar JL. .Hard coatings for mechanical applications[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2002(3/4):181-190. |
[25] | Yuki Togashi;Yuko Hirohata;Tomoaki Hino .Characterization of CNx films prepared by reactive magnetron sputtering[J].Vacuum,2002,66:391. |
[26] | de Sanchez NA.;Carrasco C.;Prieto P. .Effect of nitrogen content on the microstructure and mechanical properties of CNx thin films[J].Physica, B. Condensed Matter,2003(1/4):318-322. |
[27] | Zocco A;Perrone A;Broitman E et al.Mechanical and tribological properties of CNx films deposited by reactive pulsed laser ablation[J].Diamond and Related Materials,2002,11:98. |
[28] | 杨兵初,罗成林.氮化碳薄膜的电子结构和光学性质[J].中国有色金属学报,2002(01):57-60. |
[29] | 乔学亮,孙增辉,程宇航,陈建国,熊锋,王洪水,邓德圣.N含量对CN薄膜折射率的影响[J].硅酸盐学报,2003(05):465-469. |
[30] | Monclus M A;Cameron D C;Chowdhurry A K M S .Electrical properties of reactively sputtered CNx films[J].Thin Solid Films,1999,341:94. |
[31] | Lazar G;Clin M;Therass S et al.Effect of the RF power and deposition temperature on the electrical and vibrational properties of carbon nitride films[J].Diamond and Related Materials,2003,12:201. |
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