本文用溶胶-凝胶技术，以无机盐氧氯化锆（ZrOCl2·8H2O）为前驱体，在不锈钢表面上制备了含SiO2相的ZrO2缓冲膜，并用真空蒸镀法在其上沉积一层厚度为150nm的金膜．通过XRD、FTIR、SEM及AES等测试手段对ZrO2缓冲膜的性能及其热处理过程中的物理化学变化进行了表征.结果表明；不锈钢箔基体上的四方ZrO2膜在（200）晶面上有择优取向的特点，缓冲膜与基体之间存在着一定程度的互扩散作用．同时，法向热发射率的测试结果表明，850℃热处理后材料仍能保持极低的热发射率（ε=0．043），说明缓冲膜有效地阻挡了金膜与基体之间的高温互扩散作用．
SiO2 doped ZrO2 buffer layers were successfully prepared by a sol-gel technique using zirconyl
chloride octahydrate ZrOCl2·8H2O as the precursor on stainless steel and a gold film was deposited on the buffer layer by a vacuum evaporation
deposition method. XRD, FTIR, SEM and AES measurements were used to investigate the performance of the layers as well as the physical and
chemical changes after annealing. The results show that tetragonal ZrO2 buffer layers possess a preferential orientation at the (200)
crystal plane due to the influence of stainless steel substrate. And there is some interdiffusion at the interface of buffer layer and
substrate, which improves the adhesion of ZrO2 layer and stainless steel. The measurement of normal emittance(ε) of Au-ZrO2-SS
before and after 850℃ heat treatment indicates that ZrO2 buffer layers can effectively suppress the interdiffusion of the gold film
and the substrate.
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