本文对不同性质的膜─基体系通过确定Ｃ的具体取值对Ｊｏｅｎｓｓｏｎ－Ｈｏｇｍａｒｋ模型予以修正，研究厂等离子体增强化学气相沉积Ｔｉ（Ｃ，Ｎ）薄膜的硬度及其随成分组织的变化。Ｔｉ（Ｃ、Ｎ）薄膜具有较小的晶粒尺寸和较高的残余压应力，其硬度远高于一般的整体材料，在确定的。工艺条件下，其值上要取决于膜的含碳量，大体成线性增加关系。
The model proposed by Joensson and Hogmark takes the parameter, C, as a constant for different film-substrate systems. The parameter was modified in the present paper according to different hardness ratio of film to substrate and used them to study the variation of the hardness of PCVD Ti(C, N) films with the composition and the microstructure.Comparing with bulk materials, Ti(C, N) films have a relative high hardness due to the smaller crystal size and the higher compressive residual stress. It is controlled by the carbon content and hold a linear increase with the carbon content for a definite deposition technique.Correspondent:(XU Kewei, professor, Hi'an Jiaotong University, Hi'an 710049)
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