采用离子束溅射方法制备了TiB2硬质薄膜AFM观察表明薄膜表面非常光滑AES、XRD和XPS分析证明薄膜中上要是B、Ti比为1.8,六方结构的TiB2多品体,且呈现强烈的(101)择优取向.由超显微压痕测量系统测得的加载、卸载曲线计算得到的薄膜的防微硬度高达48GPa。
Hard TiB2 films have been synthesized by ion beam sputtering. Observation by AFM indicated that the surface of the prepared TiB2 films is very smooth. AES, XRD and XPS analysis showed that the B: Ti ratio in the films is 1.8, the formed films are pricipal
参考文献
| [1] | |
| [2] | HolleckH,JVacSciTechnol,1986,A4(6):26612ShappirioJR,FinneganJJ,LuxRA,KwistkowskiJ,KattelusandH,NicoletMAJVacSciTechnol,1985,A3:22553BunshanRF,SchrammRJ,NimmagaddaR,MovchanandBA,BorodinVPThinSolidFilms,1977,40 |
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