A superhard α-Si_3N_4 film,deposited on metal substrate,was produced by laser chemical vapor deposition adopting a kW-level high power CO_2 laser.Most films are composed of fine Si_3N_4 partieles.They join the metal substrate in strong bond.The films have super hardness,excellent resistance to wear and corrosion,etc.Their thickness may be controlled within 5-30 μm.
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