将AAO模板分别在体积比为1:9(约15%(质量分数))的H_3PO_4溶液和10%(质量分数)的NaOH溶液中进行蚀刻处理,结果显示,AAO模板经过一个扩孔过程,最终孔间壁较薄部分被彻底蚀刻掉,孔间壁较厚部分留下形成氧化铝纳米线状结构.在2种蚀刻溶液中.NaOH溶液对模板的蚀刻比H_3PO_4溶液的快.这些结果对于AAO扩孔、氧化铝纳米结构的合成以及模板的去除具有一定的指导意义.
Chemical etching treatment of AAO template is important for the further application of AAO template. The chemical etching is carried out by immersing AAO template in 1:9(V/V, about 15wt%) H_3PO_4 solution and 10wt% NaOH solution respectively. The results demonstrate that the pores of AAO template are widened firstly, and the alumina nanowires are synthesized finally in etching process. In the two kinds of etching solution. Etching faster in NaOH solution than in H_3PO_4 solution. The results is valuable in widening AAO template pores, synthesizing the alumina nanostructurevS and removing the AAO template after assembly of materials.
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