通过微合金化获取高性能多晶硅,研究了不同Sn掺入量对定向凝固多晶硅位错及少子寿命的影响.将高纯Sn掺入到精炼冶金级硅(UMG-Si)中,定向凝固多晶硅.研究发现,硅锭位错密度沿轴向分布为中间低,底部和顶部高.在晶体硅中掺入Sn后,不影响硅的电学性能,但明显减少硅锭的位错密度.当掺入Sn含量为20 ppmw、50 ppmw和100 ppmw时,硅锭平均少子寿命由未掺Sn硅锭的0.81μs分别增加至1.22 μs、1.47 μs和1.31μs.掺Sn可减少位错密度和增加少子寿命,归因于替代位的Sn原子引入晶格应力,Sn易捕获空位V形成Sn-V对,抑制间隙原子形核.
参考文献
[1] | 何秋湘;李京伟;李彦磊;班伯源;白枭龙;陈健;戴松元.微合金化在晶体硅太阳电池中应用的研究进展[J].材料导报,2016(1):7-13. |
[2] | M. Forster;E. Fourmond;F. E. Rougieux;A. Cuevas;R. Gotoh;K. Fujiwara;S. Uda;M. Lemiti.Boron-oxygen defect in Czochralski-silicon co-doped with gallium and boron[J].Applied physics letters,20124(4):042110-1-042110-4. |
[3] | Wang, P.;Yu, X.;Chen, P.;Li, X.;Yang, D.;Chen, X.;Huang, Z..Germanium-doped Czochralski silicon for photovoltaic applications[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,20118(8):2466-2470. |
[4] | M.P. Bellmann;T. Kaden;D. Kressner-Kiel;J. Friedl;H.J. Moeller;L Arnberg.The impact of germanium doping on the dislocation distribution in directional solidified mc-silicon[J].Journal of Crystal Growth,20111(1):1-4. |
[5] | Ganchenkova M.;Nazarov A.;Kuznetsov A..Formation and stability of radiation defect complexes in Si and Si : Ge: Composition and pressure effects[J].Nuclear Instruments and Methods in Physics Research, Section B. Beam Interactions with Materials and Atoms,20030(0):107-113. |
[6] | Yohan Yoon;Yixin Yan;Nels P. Ostrom;Jinwoo Kim;George Rozgonyi.Deep level transient spectroscopy and minority carrier lifetime study on Ga-doped continuous Czochralski silicon[J].Applied physics letters,201222(22):222107-1-222107-4. |
[7] | A. Chroneos;C. A. Londos;E. N. Sgourou.Effect of tin doping on oxygen- and carbon-related defects in Czochralski silicon[J].Journal of Applied Physics,20119(9):093507-1-093507-8. |
[8] | I. Yonenaga;T. Taishi;K. Inoue;R. Gotoh;K. Kutsukake;Y. Tokumoto;Y. Ohno.Czochralski growth of heavily tin-doped Si crystals[J].Journal of Crystal Growth,2014Jun.1(Jun.1):94-97. |
[9] | Ma, Xiaodong;Yoshikawa, Takeshi;Morita, Kazuki.Elemental Properties of Si:Si-Sn Solid Solution and Diffusion Coefficient in the Si-Sn Melt[J].Science of advanced materials,20148(8):1697-1701. |
[10] | 姜婷婷 .太阳电池用晶体硅中金属杂质与缺陷的相互作用研究[D].浙江大学,2014. |
[11] | Mukannan Arivanandhan;Raira Gotoh;Tatsuro Watahiki;Kozo Fujiwara;Yasuhiro Hayakawa;Satoshi Uda;Makoto Konagai.The impact of Ge codoping on the enhancement of photovoltaic characteristics of B-doped Czochralski grown Si crystal[J].Journal of Applied Physics,20124(4):043707-1-043707-6. |
[12] | Li Dongsheng;Zhao Yiying;Yang Deren.Effects of Germanium on Movement of Dislocations in p-Type Czochralski Silicon[J].稀土学报(英文版),2006(z1):83-86. |
[13] | Noritaka Usami;Ryusuke Yokoyama;Isao Takahashi;Kentaro Kutsukake;Kozo Fujiwara;Kazuo Nakajima.Relationship between grain boundary structures in Si multicrystals and generation of dislocations during crystal growth[J].Journal of Applied Physics,20101(1):013511-1-013511-5. |
[14] | Macdonald D;Cuevas A;Kinomura A;Nakano Y;Geerligs LJ.Transition-metal profiles in a multicrystalline silicon ingot[J].Journal of Applied Physics,20053(3):3523-1-3523-7-0. |
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