本文研究了Mo、Co、Nb等元素离子注入及薄膜沉积方法对TiN薄膜性能的影响。采用SRV磨损实验、表面形貌轮廓等方法研究分析了离子注入对TiN薄膜的摩擦系数、耐磨性能、显微硬度的影响规律。实验结果表明:磁过滤电弧镀的TiN薄膜的摩擦系数曲线与常规电弧镀TiN薄膜的摩擦系数曲线相差很大,且耐磨性能优于电弧镀TiN薄膜。采用离子注入可降低TiN薄膜的摩擦系数。在5N载荷磨损条件下,随注入剂量和注入元素的不同其摩擦系数变化较大。在30N载荷磨损条件下,样品摩擦系数均接近0.5。离子注入Mo、Co、Nb均可显著提高TiN薄膜的耐磨性,其中注入Mo的试样耐磨性最好。
The effect of Mo, Co, Nb ions implantation and the preparing methods of TiN films were studied. The tribological properties, wearing resistance and micro-hardness of TiN films before and after ions implantation were investigated with helps of SRV friction and wear tester and Talysurf 5P-120 instrument. Compared with the sample that TiN film was prepared by cathodic vacuum arc technique, the friction coefficient curve was different when TiN film was prepared by filtered cathodic vacuum arc technique, and its wearing resistance was better. The friction coefficients decreased after ions implantation. Under the load of 5N, the implanted elements and the implanted doses had large influences on the friction coefficients. The friction coefficients came close to 0.5 while the load raised to 30N. The wear-resisting property of these samples was improved significantly after Mo, Co, Nb ions implantation. And the best wearing resistance could be obtained after Nb implantation.
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