以无水乙醇为溶剂、氨水为催化剂,利用正硅酸乙酯水解所得的SiO2微球为内核,以硝酸亚铈为铈源、六亚甲基四胺为沉淀剂,采用化学沉淀法制备了具有草莓状包覆结构的CeO2@SiO2复合颗粒.利用X射线衍射仪、透射电子显微镜、场发射扫描电镜、能谱仪、X射线光电子能谱仪、纳米激光粒度分布仪等对所制备样品的结构进行了表征.将所制备的包覆结构CeO2@SiO2复合磨料用于光学石英玻璃的化学机械抛光,采用原子力显微镜观察了抛光表面的微观形貌,并测量了表面粗糙度.结果表明,所制备的CeO2@SiO2复合颗粒呈规则球形,粒度分布均匀,粒径为150~200nm,且具有明显的草莓状包覆结构,大量纳米CeO2颗粒紧密包覆在SiO2表面.AFM测量结果表明,抛光后玻璃表面划痕得到明显改善,在10μm×10μm范围内表面粗糙度RMS值由1.65nm降至0.484nm.
参考文献
[1] | Tomohiro Hirose;Kazuya Saito;Akira J Ikushima .Structural relaxation in sputter-deposited silica glass[J].Journal of Non-Crystalline Solids,2006,352(21-22):2198. |
[2] | Tomozawa, M;Koike, A;Ryu, SR .Exponential structural relaxation of a high purity silica glass[J].Journal of Non-Crystalline Solids,2008(40/41):4685-4690. |
[3] | A.Yu. Shmykov;S.V. Mjakin;I.V. Vasiljeva;V.N. Filippov;M.E. Vylegzhanina;T.E. Sukhanova;V.E. Kurochkin .Electron Beam Initiated Grafting Of Methacryloxypropyl-trimethoxysilane To Fused Silica Glass[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2009(12):6391-6396. |
[4] | Gross, TM;Tomozawa, M .Crack-free high load Vickers indentation of silica glass[J].Journal of Non-Crystalline Solids,2008(52/54):5567-5569. |
[5] | Suratwala T;Steele R;Feit MD;Wong L;Miller P;Menapace J;Davis P .Effect of rogue particles on the sub-surface damage of fused silica during grinding/polishing[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2008(18):2023-2037. |
[6] | Feng XD;Sayle DC;Wang ZL;Paras MS;Santora B;Sutorik AC;Sayle TXT;Yang Y;Ding Y;Wang XD .Converting ceria polyhedral nanoparticles into single-crystal nanospheres[J].Science,2006(5779):1504-1508. |
[7] | Seung-Ho Lee;Zhenyu Lu;S.V. Babu .Chemical mechanical polishing of thermal oxide films using silica particles coated with ceria[J].Journal of Materials Research,2002(10):2744-2749. |
[8] | Song Xiaolan;Jiang Nan;Li Yukun et al.Synthesis of CeO2-coated SiO2 nanoparticle and dispersion stability of its suspension[J].Materials Chemistry and Physics,2008,110(01):128. |
[9] | Lei, H;Lu, HS;Luo, JB;Lu, XC .Preparation of alpha-alumina-g-polyacrylamide composite abrasive and chemical mechanical polishing behavior[J].Thin Solid Films,2008(10):3005-3008. |
[10] | Armini S;Whelan C M;Moinpour M et al.Composite po-lymer core-silica shell abrasives:The effect of polishing time and slurry solid content on oxide CMP[J].Electrochem So-lid-State Lett,2007,10(09):243. |
[11] | Armini S;Whelan CM;Moinpour M;Maex K .Composite polymer core-silica shell abrasives: The effect of the shape of the silica particles on oxide CMP[J].Journal of the Electrochemical Society,2008(6):H401-H406. |
[12] | S. Armini;J. De Messemaeker;C. M. Whelan .Composite Polymer Core-Ceria Shell Abrasive Particles during Oxide CMP: A Defectivity Study[J].Journal of the Electrochemical Society,2008(9):(H)653-660. |
[13] | Armini S;Whelan C M;Maex K .Engineering polymer core-silica size in composite abrasives for CMP applications[J].Electrochemical and Solid-State Letters,2008,11(10):280. |
[14] | Cecil A. Coutinho;Subrahmanya R. Mudhivarthi;Ashok Kumar;Vinay K. Gupta .Novel ceria-polymer microcomposites for chemical mechanical polishing[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2008(5P2):3090-3096. |
[15] | 肖保其,雷红.纳米SiO2/CeO2复合磨粒的制备及其抛光特性研究[J].摩擦学学报,2008(02):103-107. |
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