通过催化剂辅助有机前驱体热解,合成了单晶Si3N4纳米带.其工艺主要包括3个步骤:有机前驱体低温交联固化、高能球磨粉碎和高温热解.采用SEM、XRD、EDS、TEM和HRTEM等分析手段对Si3N4纳米带进行了详细的表征,对Si3N4纳米带的生长机制进行了深入的探讨.
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