利用Nd-YAG激光器对采用物理气相沉积PVD方法制备的非晶态SnSeSbTm薄膜材料进行了激光晶化处理,晶化后TEM表明,薄膜材料由非晶态结构转变成晶态结构,实现了由非晶态到晶态的相变;从相变机理角度阐述了成分差异对相变程度的影响.
参考文献
| [1] | 徐端颐 .光盘存储系统设计原理[J].,1997,57:237. |
| [2] | [OL].http://www.cnnic.org |
| [3] | 陈光华.新型电子薄膜材料[M].北京:化学工业出版社,2002:275. |
| [4] | 刘启明,干福熹,顾冬红.激光作用下Ges2非晶半导体薄膜的性能及结构变化[J].无机材料学报,2002(04):805-810. |
| [5] | DrexlerE;Peterson C .The nanotechnology revolution[J].Journal of Non-Crystalline Solids,1991,20:23. |
| [6] | HuangCR;Lee M S;Chang Y S et al.Optical and Raman correlation of laser recrystallised and quenched amorphous silicon film a microprobe study[J].Journal of Physics D:Applied Physics,1990,23:729. |
| [7] | LeeMC;TsengCJ;HuangCR;etal .[J].Journal of Applied Physics,1987,26:192. |
| [8] | Boyce JB.;Lu JP.;Ho J.;Street RA.;van Schuylenbergh K.;Wang Y. .Pulsed laser crystallization of amorphous silicon for polysilicon flat panel imagers[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2002(Pt.2):731-735. |
| [9] | SongIH;Kim C H;Nam W J et al.A poly-Si thin film transistor fabricated by new excimer laser recrystallization employing floating active structure, current[J].Journal of Applied Physiology,2002,2:225. |
| [10] | Watakabe H.;Tsunoda Y.;Andoh N.;Sameshima T. .Characterization and control of defect states of polycrystalline silicon thin film transistor fabricated by laser crystallization[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2002(Pt.2):1321-1325. |
| [11] | Hideo Hosono;Masaaki Kurita;Hiroshi Kawazoe .Excimer laser crystallization of amorphous indium-tin oxide thin films and application to fabrication of Bragg gratings[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1999(12):137-140. |
| [12] | Kim CH.;Song IH.;Nam WJ.;Han MK. .Excimer laser recrystallization of selectively floating a-Si thin film[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2002(Pt.2):721-725. |
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