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本文制备出(110)峰取向的绒面结构MOCVD-ZnO:B薄膜并提出CH3COOH湿法刻蚀的表面处理技术.研究表明,绒面结构ZnO:B薄膜具有"类金字塔"晶粒形状;处理前后ZnO:B薄膜的微观结构,方块电阻和光学性能变化不大.适当的表面处理有助于使薄膜表面趋于柔和,有望改善ZnO/Si界面特性,从而应用于μc-Si薄膜太阳电池.

参考文献

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[3] Bailat J;Domine D;Schluchter R.High-dficiency P-I-N Microcrystalline and Micromorph Thin Film Silicon Solar Cells Deposited on LPCVD ZnO Coated Glass Substrates[A].,2006:1465.
[4] Anna Selvan J A;Alan Delahoy E;Sheyu Guo et al.A New Light Trapping TCO for μc-Si:H Solar Cells[J].Solar Energy Materials and Solar Cells,2006,90:3371.
[5] Fay S;Steinhauser J;Oliveira N;Vallat-Sauvain E;Ballif C .Opto-electronic properties of rough LP-CVD ZnO : B for use as TCO in thin-film silicon solar cells[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2007(24):8558-8561.
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