以锆酸丁酯和苯甲酰丙酮为源,结合Sol-gel工艺,以溶液浸渍法制备具有负性光刻胶性质的ZrO2光敏凝胶.再通过掩膜紫外曝光经显影工艺获得光栅周期在2~10μm,深度120~200nm的ZrO2薄膜光栅.采用紫外分光光度计、红外分光光度计、AFM监控图形转移过程研究了图形精确转移的工艺并优化了工艺参数.
参考文献
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