采用熔融共混的方法在双螺杆挤出机上制备出尼龙66/SiO2纳米复合材料,并利用红外光谱(FT-IR)、X射线光电子能谱(XPS)以及透射电子显微镜(TEM)对尼龙66/SiO2的界面进行了分析,结果发现,在熔融共混过程中经过表面改性的SiO2能够和尼龙66基体发生相互作用,形成一种基于共价键和氢键连接的界面层结构.力学性能测试结果表明这种界面结构的形成有利于纳米复合材料拉伸强度的提高.但对材料缺口冲击强度的影响并不明显.
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