综述了硅中氮离子注入的应用和研究进展.主要讨论了氮离子注入形成SOI层的原理、质量的影响因素和电学性能;介绍了氮离子注入在制备超薄氧化栅极及其抑制掺杂杂质原子特别是硼原予扩散等方面的研究和应用.
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