采用脉冲激光沉积制备了新型无铅压电Bi0.5(Na0.7K0.1Li0.2)0.5TiO3陶瓷薄膜,分别利用X射线衍射仪、X射线光电子谱、俄歇电子能谱、原子力显微镜及扫描电镜研究了该薄膜的晶体结构、组成成分及表面形貌.结果表明,薄膜基体温度和工作气压对所生长的薄膜影响较大;在SiO2/Si基片上制备Bi0.5(Na0.7K0.1Li0.2)0.5TiO3薄膜的最佳温度和氧气压力分别为600℃和13Pa;利用脉冲激光沉积的薄膜具有精细的表面结构.
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