利用磁过滤阴极电弧镀分别在硬质合金和高速钢基体上沉积厚度约2～3μm的TiN薄膜,并用MEVVA源离子注入装置对TiN薄膜注入金属离子V+和Nb+.应用北京同步辐射装置(BSRF)的同步辐射光源,采用掠入射X射线衍射(GIXRD)的方法对TiN薄膜表面离子注入层的微观结构进行了分析研究.结果表明:未经过离子注入的TiN薄膜均存在特定方向的择优取向,而较小剂量(1×10(17)ions/c㎡)的离子注入可以使晶粒细化、择优取向减弱或改变;当离子注入的剂量达到5×10(17)ions/c㎡时,TiN薄膜表面离子注入层被非晶化.结合透射电镜的研究结果,观察到TiN薄膜表面非晶层的厚度约为50～100nm,并简要地讨论了离子注入过程对微观结构的影响机制.
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