以乙二醇乙醚为溶剂,异丙醇铝为前驱物,乙酰丙酮为螯合剂,采用溶胶-凝胶法和旋转涂覆工艺,在不同衬底上制备了氧化铝薄膜.通过X射线衍射仪(XRD)、场发射扫描电子显微镜(FESEM)和金相显微镜等手段对薄膜的微观结构和表面形貌进行了表征.结果表明,溶胶-凝胶法制得的薄膜为无定形结构,表面均匀、致密、无裂纹.通过对薄膜电流密度与电场和时间(J-E和J-t)曲线的测量,对薄膜的电学性能进行了研究.薄膜击穿场强约为2.0～3.0MV/cm,在电场强度为0.5MV/cm时,漏电流密度约为9.0×10-6 A/cm2.
参考文献
| [1] | Qu Xixin;Guo Bijun.Thin film physics[M].北京:电子工业出版社,1994:223. |
| [2] | Mansour S;Robaee A;Subbanna G N et al.Studies on the optical and structural properties of ion-assisted depo-sition Al2O3 thin films[J].Vacuum,1994,45(01):97-102. |
| [3] | Pradhan SK.;Reucroft PJ.;Ko YK. .Crystallinity of Al2O3 films deposited by metalorganic chemical vapor deposition[J].Surface & Coatings Technology,2004(3):382-384. |
| [4] | Kim JB.;Kwon DR.;Chakrabarti K.;Lee C.;Oh KY.;Lee JH. .Improvement in Al2O3 dielectric behavior by using ozone as an oxidant for the atomic layer deposition technique[J].Journal of Applied Physics,2002(11):6739-6742. |
| [5] | Maniv S;Westwood W D .Discharge characteristics for magnetron sputtering of A1 in Ar and Ar/O2 mixtures[J].Journal of Vacuum Science and Technology,1980,17(08):743-751. |
| [6] | 朱炎,赵登涛,狄国庆,方亮.非晶氧化铝超薄膜中的电荷输运特性[J].功能材料,2001(03):296-297,300. |
| [7] | L. A. Majewski;R. Schroeder;M. Grell;P. A. Glarvey;M. L. Turner .High capacitance organic field-effect transistors with modified gate insulator surface[J].Journal of Applied Physics,2004(10):5781-5787. |
| [8] | A. Ortiz;J. C. Alonso;V. Pankov;A. Huanosta;E. Andrade .Characterization of amorphous aluminum oxide films prepared by the pyrosol process[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2000(1):74-79. |
| [9] | 杨志华,余萍,肖定全,王欢.利用无机盐制备γ-Al2O3粉体与薄膜的工艺技术研究[J].功能材料,2004(04):474-476. |
| [10] | 晏良宏,蒋晓东,江波.溶胶-凝胶法制备氧化铝光学薄膜[J].化学研究与应用,2008(07):887-889. |
| [11] | Chengbin Jing;Xinguang Xu;Jinxia Hou .Preparation of compact A12O3 film on metal for oxidation resistance by polyvinylpyrrolidone[J].Journal of Sol-Gel Science and Technology,2007(3):321-327. |
| [12] | Masalski J;Gluszek J;Zabrzeski J et al.Improvement in corrosion resistance of the 316L stainless steel by means of Al2 O3 coatings deposited by the sol-gel method[J].Thin Solid Films,1999,349(01):186-190. |
| [13] | Yoldas B E .A transparent porous alumina[J].American Ceramic Society Bulletin,1975,54(03):286-288. |
| [14] | T. Seino;T. Sato .Aluminum oxide films deposited in low pressure conditions by reactive pulsed dc magnetron sputtering[J].Journal of Vacuum Science & Technology, A. Vacuum, Surfaces, and Films,2002(3):634-637. |
| [15] | Bhatia C S;Guthmiller G;Spool A M .Alumina films by sputter deposition with Ar/O2:preparation and characterization[J].Journal of Vacuum Science and Tech-nology A,1989,7(03):1298-1302. |
| [16] | Jiyoul Lee;S. S. Kim;Seongil Im .Electrical properties of aluminum oxide films deposited on indium-tin-oxide glasses[J].Journal of Vacuum Science & Technology, B. Microelectronics and Nanometer Structures: Processing, Measurement and Phenomena,2003(3):953-956. |
| [17] | Ha WH.;Choo MH.;Im S. .Electrical properties of Al2O3 film deposited at low temperatures[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2002(1):78-82. |
| [18] | B. G. Segda;M. Jacquet;J. P. Besse .Elaboration characterization and dielectric properties study of amorphous alumina thin films deposited by r. f. magnetron sputtering[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2001(1):27-38. |
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