纳米器件包括纳米电子器件和纳米光电器件,是未来新型仪器、设备生产与制造的基础.因此,它们的设计、制造方法和技术受到了人们的广泛关注.介绍了用图形化技术实现纳米器件设计与制造的应用研究进展.
参考文献
| [1] | 顾宁,黄岚,张宇,廖建辉,夏强,王伟,傅德刚,沈浩瀛,陈堂生,郝西萍,彭力,赵丽新.制造纳米电子器件的技术途径[J].华北工学院测试技术学报,2000(04):241. |
| [2] | Fang C Y.Using phase shifting to extend 248nm lithography beyond the 50nm gate process[J].Solid State Technology,2002(11):39. |
| [3] | 童志义.光学光刻的极限[J].电子工业专用设备,2004(02):4-9. |
| [4] | 任黎明,王文平,陈宝钦,周毅,黄如,张兴.纳米级精细线条图形的微细加工[J].半导体学报,2004(12):1722-1725. |
| [5] | 刘玉贵;王维军;罗四维.使用VB5电子束曝光系统研制出最细分辨率剥离金属条[J].微纳电子技术,2003(7-8):562. |
| [6] | Remeika M;Bezryadin A .Sub-10 nanometre fabrication: molecular templating, electron-beam sculpting and crystallization of metallic nanowires[J].Nanotechnology,2005(8):1172-1176. |
| [7] | 钛酸钠纳米线的电传输特性研究[J].北京大学学报（自然科学版）,2005(05):764-768. |
| [8] | Derek M. Stein;Ciaran J. McMullan;Jiali Li;Jene A. Golovchenko .Feedback-controlled ion beam sculpting apparatus[J].Review of Scientific Instruments,2004(4):900-905. |
| [9] | 初明璋,顾文琪.离子束曝光技术[J].微细加工技术,2003(03):9-15. |
| [10] | 顾宁 .分子自组装及应用[J].材料导报,1997,11(03):38. |
| [11] | 付宏刚,刘克松,王江,张密林.功能纳米结构的组装[J].哈尔滨工业大学学报,2005(07):978-982. |
| [12] | Collier C P;Wong E W;Belobradsky M et al.Electronically configurable molecular-based logic gates[J].Science,1999,285:391. |
| [13] | Rinaldi R.;Cingolani R. .Electronic nanodevices based on self-assembled metalloproteins[J].Physica, E. Low-dimensional systems & nanostructures,2004(1):45-60. |
| [14] | De Feyter S;Miura A;Yao S;Chen Z;Wurthner F;Jonkheijm P;Schenning APHJ;Meijer EW;De Schryver FC .Two-dimensional self-assembly into multicomponent hydrogen-bonded nanostructures[J].Nano letters,2005(1):77-81. |
| [15] | 贺英,王均安,桑文斌,吴若峰,颜莉莉,方云英.采用高分子自组装ZnO纳米线及其形成机理[J].化学学报,2005(12):1037-1041. |
| [16] | Motte L;Billoudet F;Pileni M P et al.[J].Journal of Physical Chemistry B,1997,101:138. |
| [17] | 王凡,张玉玲,卫庆硕,吴凯,谢有畅.阳极氧化铝模板上热扩散法制备MoOx纳米阵列[J].物理化学学报,2004(06):637-641. |
| [18] | Yao Junen .Nano-measuring instruments and nano-machining technology engineering[J].Science,2003,15(01):33. |
| [19] | 庞世谨.原子操纵的进展[J].现代科学仪器,1998(1-2):44. |
| [20] | 傅惠南.应用SPM技术开展纳米切削加工[J].电子显微学报,2001(05):615-619. |
| [21] | 刘赛锦,申自勇,侯士敏,顾镇南,薛增泉.用原子力显微镜操纵碳纳米管的研究[J].物理化学学报,2003(03):233-236. |
| [22] | Sunwoo Lee;Haiwon Lee;Byung-jae Park .Selective growth of nanometre scale structures with high resolution using thermal energy in AFM lithography[J].Nanotechnology,2005(12):3137-3141. |
| [23] | 梁迎新,王太宏.纳米器件的一种新制造工艺 --纳米压印术[J].微纳电子技术,2003(04):2-7. |
| [24] | Nano-Imprint Lithography Standards[J].European semiconductor,2005(9):32-33. |
| [25] | Richard BUNK;Patrick CARLBERG;Alf MANSSON;Ian A. NICHOLLS;Paer OMLING;Mark SUNDBERG;Sven TAGERUD;Lars MONTELIUS .Guiding Molecular Motors with Nano-Imprinted Structures[J].Japanese journal of applied physics,2005(5a):3337-3340. |
| [26] | Wilbur James L;Kumar Amit;Kim Enoch et al.Microfabrication by microcontact printing of self-assembled monolayers[J].Advanced Materials,1994,6(7-8):600. |
| [27] | Lin Yan;Wilhelm T. S. Huck;George M. whitesides .Self-Assembled Monolayers (SAMs) and Synthesis of Planar Micro- and Nanostructures[J].Journal of macromolecular science.Polymer reviews,2004(2):175-206. |
| [28] | George A. Riley .Fabrication of Wafer-Level Nano-Optics[J].Advanced packaging,2004(11):18-20,22,25-0. |
| [29] | Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels[J].Applied physics letters,2003(8):1632-1634. |
| [30] | David P. Mancini;Douglas J. Resnick;S. V. Sreenivasan;Michael P. C. Watts .S-FIL for sub-80nm contact hole patterning[J].Solid State Technology,2004(2):55-56,58-0. |
| [31] | 崔铮,陶佳瑞.纳米压印加工技术发展综述[J].世界科技研究与发展,2004(01):7-12. |
| [32] | 王素娜,江国庆,白俊峰,游效曾.无机分子纳米材料的研究进展[J].无机化学学报,2005(01):1-11. |
| [33] | 高宁,郭范,郑伟威,陈茜.六方柱与六角片状CdS晶体的水热法生长[J].人工晶体学报,2005(04):633-636,632. |
| [34] | Oekermann Torsten;Zhang Dongshe;Yoshida Tsukasa et al.Electron transport and back reaction in nanocrystalline TiO2 films prepared by hydrothermal crystallization[J].Journal of Physical Chemistry B,2004,108(07):2227. |
| [35] | 郭云,覃东欢,力虎林.Fe0.3Co0.7纳米有序阵列的制备及磁学特性[J].兰州大学学报（自然科学版）,2005(04):56-59. |
| [36] | 李明伟,胡征,王喜章,吴强,吕忆农,陈懿.电晕放电等离子体增强化学气相沉积合成碳纳米管阵列[J].科学通报,2003(01):32-34. |
| [37] | Chu SZ.;Wada K.;Inoue S.;Todoroki S. .Fabrication of oxide nanostructures on glass by aluminum anodization and sol-gel process[J].Surface & Coatings Technology,2003(0):190-194. |
| [38] | 杨文茂,刘艳文,徐禄祥,冷永祥,黄楠.溅射沉积技术的发展及其现状[J].真空科学与技术学报,2005(03):204-210. |
| [39] | 王文文,刁训刚,王峥,王天民.直流磁控溅射ZnO：Al薄膜的光电和红外发射特性[J].北京航空航天大学学报,2005(02):236-241. |
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