研究了在低温熔点中（≤２００℃）电沉积Ａｌ－Ｔｉ合金粉珂时，电沉积条件对沉积合金铖分的影响。并用Ｘ射线和透射电镜分析了其组成与结构关系。结果表明，当电沉积Ａｌ－Ｔｉ合金粉中含Ｔｉ量的２３％（质量分数，下同）以下时其结构为Ｔｉ在铝中的固溶体，而当含Ｔｉ量为４４％时，其结构类同于ＡｌＴｉ金属间化合物。
The effects of electdeposited wndition on chemical canposition of deposited Al-Ti alloy paYder were studied in Im temperature mlten salts (below 200°C ). ?he relationship between chemical amposition and structure were examined by X-ray diffraction and ?EM electmn diffraction. 'The results indicated that when Ti content of deposited Al-Ti alloy &er was less than 23 % , the alloy pa~der was solid solution of Ti in Al, when Ti content was 44 % , the alloy &er becane Am intemtallic canpound.
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