采用多弧离子镀技术和Ti--Al合金靶及Zr单质靶的组合, 在高速钢基体上制备了(Ti,Al,Zr)N多元N梯度硬质反应膜。分别用扫描电镜、X射线衍射仪观察测定(Ti, Al, Zr)N梯度膜膜层的表面、断面形貌、成分以及相结构, 研究了(Ti, Al, Zr)N多元氮梯度硬质反应膜的组织结构和性能。结果表明, 与TiN、(Ti, Al)N、(Ti,Zr)N及(Ti, Al, Zr)N等单层硬质膜相比, 采用Ti--Al合金靶及单质Zr靶组合方式制备的(Ti, Al, Zr)N多元氮梯度硬质反应膜具有较高的硬度和膜/基附着力, 硬度最高可达HV6000, 膜/基附着力大于180 N。同时, 膜层还具有良好的抗热震性能。
(Ti, Al, Zr)N multi–component hard films with N–gradient distributions were prepared by multi arc ion plating (MAIP) technology using the combined pure Zr and Ti–Al alloy targets. The surface and cross–fracture morphology, the surface compositions and the phase structure of the as–deposited films were observed and measured. The effects of bias voltage on the film quality, phase structure, the micro–hardness, the adhesion between film and substrate and the thermal shock resistance were investigated. In comparison with TiN, (Ti, Al)N and (Ti, Zr)N films, the as–deposited (Ti,Al,Zr)N films from the combination of pure Zr and Ti–Al alloy targets exhibited higher micro–hardness values even up to HV6000. Each of the as–deposited films has very high adhesion strength, in terms of critical load, larger than 180 N. The good heat shock resistance was also reached for each of the as–deposited films.
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