利用金属有机化合物气相沉积(MOCVD)技术生长了双层InAs/GaAs量子点,并将GaInP作为应力补偿层引入到其中,采用原子力显微镜(AFM)对量子点的结构和生长质量进行了表征与分析.实验结果表明,应变补偿层的采用可有效改善第二层量子点质量:(1)面密度最高可达7.5×1010 cm-2,而没有应变补偿层的样品的面密度仅为5.8×1010 cm-2;(2)缺陷岛密度可从不采用应变补偿时的9.6×107 cm-2降低至2.8×107 cm-2;(3)量子点的均匀性和尺寸也明显改善.此外,不同应变补偿层厚度比较实验结果显示,厚度过高或过低的应变补偿层都不能起到很好的补偿作用,取1～3 nm之间为佳;不同GaInP补偿层组分的比较实验结果表明,Ga组分为0.566的样品补偿效果比0.606的样品更好.
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