着重阐述了三价铬的发展历史、电镀工艺、阴极反应机理及电镀中存在的问题.对于当前镀铬中存在的问题,从电镀体系的选择、配位剂的选择、阳极及电镀电源的选择、pH值的影响等方面进行了分析与总结.最后对三价铬电镀的发展作了展望.
A review was provided of the history, electroplating technology, cathodic reaction mechanism and existing problems in trivalent chromium electroplating. The existing problems were analyzed and discussed in the light of selection of electroplating system, complexing agent, anode and power source as well as the influence of pH value. Finally, the development of trivalent chromium electroplating was prospected.
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