针对基于原子力显微镜(AFM)的探针相变存储研究中存储介质和存储方贩性的研究.比较了用直流磁控溅射部分不同工艺参数所制备的GeSb2Te4薄膜的表面性能,同时对探针诱导相变机理进行了初步探讨.试验观察的结果表明,利用AFM导电探针对相变化材料GeSb2Te4膜施加一定的直流电压,可以通过形貌和相结构的变化来获得存储的信息点,并且通过施加一定时间的反向电压可以实现信息点的消除.
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