Ⅲ-Ⅴ族半导体纳米线材料被认为是高速光电探测器最有前途的材料之一.采用金属有机化学气相沉积法在GaAs(111)B衬底上生长芯-壳结构/GaAs-AlGaAs纳米线材料,GaAs芯材料的生长机制为气相-液相-固相,而AlGaAs壳材料的生长机制为气相-固相.采用场发射扫描电子显微镜和微区光荧光谱仪等测试分析手段研究了AlGaAs壳材料横向、轴向和生长方向的均匀性,探讨了生长机制对均匀性的影响.在此基础上获得了组分均匀的高晶体质量的AlGaAs壳材料,其Al组分为0.14.
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