以Mg-Al水滑石为前体,采用返混沉淀法进行插层组装合成丙烯酸根离子柱撑水滑石.利用红外光谱、X射线衍射、紫外分光光度法对其结构和性能进行了表征.结果表明,丙烯酸根阴离子可以插入纳米Mg-Al水滑石层间,其层间距由0.76nm增大到1.17nm,形成具有超分子结构的丙烯酸根离子柱撑水滑石,并模拟出其分子结构模型.这种新的插层结构材料可以增强其紫外吸收性能,进而使得其紫外屏蔽作用增强,从而成为一种集屏蔽和吸收双重功能的新型无机-有机复合紫外阻隔材料.
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