采用反应溅射的方法在具有立方织构的Ni基底上制备了CeO2,Y2O3缓冲层.Ar/H2气氛下预沉积的引入,有效地抑制了基底的氧化.同时,为保证薄膜的外延取向,预沉积时间必须和总沉积时间满足线性关系.对比CeO2,Y2O3的生长条件,发现CeO2的外延生长区间比Y2O3宽,Y2O3的生长对温度、气压等条件更为敏感.最终制备的CeO2缓冲层是纯的(100)取向,其平面内φ扫描半高宽(FWHM)为8.5°;而Y2O3存在两种平面取向,一种是Y2O3(110)‖Ni(100),另一种是Y2O3(100)‖ Ni(100).俄歇能谱观察表明,CeO2/Ni界面优于Y2O3/Ni界面.扫描电镜照片显示,CeO2,Y2O3缓冲层的表面均匀致密,无裂纹生成,但两种薄膜中,都有呈三角形的胞状突起.
参考文献
| [1] | 古宏伟,杨坚,刘慧舟,屈飞,张华.YBa2Cu3O7-x涂层导体的研究进展[J].中国稀土学报,2006(03):257-268. |
| [2] | Goyal A;Norton D P;Budai J D et al.High critical current density superconducting tapes by epitaxial deposition of YBa2Cu3Ox thick films on biaxially textured metals[J].Applied Physics Letters,1996,69:1795. |
| [3] | Qing He;Christen D K;Budai J D et al.Deposition of biaxially-oriented metal and oxide buffer-layer films on textured Ni tapes:new substrates for high-current,high-temperature superconductors[J].PHYSICA C,1997,275:155. |
| [4] | Yang Jian,LIU Huizhou,Gu Hongwei,QU fei,Fan Hongyan.Fabricating Buffer Layers for YBa2Cu3Oy Coated Conductor by Surface Oxidation Epitaxy[J].稀土学报（英文版）,2005(04):514-516. |
| [5] | Paranthaman M;Lee D F;Goyal A et al.Growth of biaxially textured RE2O3 buffer layers on rolled-Ni substrates using reactive evaporation for HTS-coated conductors[J].Superconductor Science and Technology,1999,12:319. |
| [6] | Ataru Ichinose;Yang Chauyun;Daniels G et al.Studies of the improvement in microstructure of Y2O3 buffer layers and its effect on YBa2Cu3O7-x film growth[J].Superconductor Science and Technology,2000,13:1023. |
| [7] | Ataru Ichinose;Akihiro Kikuchi;Kyoji Tachikawa et al.Deposition of Y2O3 buffer layers on biaxially-textured metal substrates[J].PHYSICA C,1998,302:51. |
| [8] | 杨坚,石东奇,常世安,袁冠森.磁控溅射法在立方织构镍基底上制备CeO2缓冲层[J].稀有金属,2000(04):292-295. |
| [9] | Safi I .A novel reactive magnetron sputtering technique for producting insulating oxides of metal alloys and other compound thin films[J].Surface and Coatings Technology,2000,135:48. |
| [10] | Musil J;Baroch P;Vlcek J;Nam KH;Han JG .Reactive magnetron sputtering of thin films: present status and trends[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2005(1/2):208-218. |
| [11] | 张华,杨坚,古宏伟,刘慧舟,屈飞.反应溅射法在立方织构镍基底上制备CeO2缓冲层[J].中国稀土学报,2006(02):188-191. |
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