采用直流磁控溅射镀膜工艺,在不同的氮氩流量比条件下,制备了玻璃基TiN薄膜.通过X射线衍射仪(XRD)、场发射扫描电子显微镜(SEM、EDS)、纳米显微硬度仪,研究了TiN薄膜的组织结构、物相组成、表面形貌、元素成份、维氏硬度,分析了氮氩流量比对TiN薄膜结晶取向、硬度的影响机理.结果表明,在低的氮氩流量比条件下,TiN薄膜以(111)晶面择优取向;随着氮氩流量比增加,择优取向由(111)晶面向(200)晶面过渡;氮氩流量比为1∶2时薄膜以(200)晶面择优取向;继续增加氮氩流量比(1∶2 ～2∶1),TiN薄膜衍射峰强度降低,晶粒尺寸减小;当氮氩流量比增加到2∶1时,薄膜开始呈现非晶态.随着氮氩流量比的增加,薄膜硬度呈现先增加后减小的趋势;当氮氩流量比为1∶1时,TiN薄膜以(200)晶面择优取向结晶,组织致密均匀,晶粒尺寸最小,具有最大的硬度值(825 HV),相比未镀膜的玻璃基片,硬度值增加了20.44％.
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